Poly vinyl alcohol re-usable masters for microneedle replication

Marco Matteucci; Mattia Fanetti; M. Casella; Michele Casella; F. Gramatica; Luca Gavioli; M. Tormen; G. Grenci; F. De Angelis; E. Di Fabrizio; Enzo Mario Di Fabrizio

doi:10.1016/j.mee.2009.01.068

Poly vinyl alcohol re-usable masters for microneedle replication

Marco Matteucci
, Mattia Fanetti
, M. Casella
, Michele Casella
, F. Gramatica
, Luca Gavioli
, M. Tormen
, G. Grenci
, F. De Angelis
, E. Di Fabrizio
, Enzo Mario Di Fabrizio

Sincrotrone Trieste
IRCCS Fondazione Don Carlo Gnocchi - Milano
National Institute for Nuclear Physics
Magna Græcia University

Risultato della ricerca: Contributo in rivista › Articolo › peer review

33 Citazioni (Scopus)

Abstract

We present the first results of microstructure replica with re-usable masters in poly vinyl alcohol (PVA). Microneedles of heights ranging from 500 to 1100 pm were fabricated through double-exposure deep Xray lithography (DXRL) process and successfully replicated. A single PVA master was used as a template to successfully replicate up to 10 PMMA microneedle arrays, suggesting that this method might be a possible alternative to PDMS processes. A preliminary characterization of the relationship between the surface roughness of the substrates and the force required for demoulding was also performed. (C) 2009 Elsevier B.V. All rights reserved.

Lingua originale	Inglese
pagine (da-a)	752-756
Numero di pagine	5
Rivista	Microelectronic Engineering
Volume	86
DOI	https://doi.org/10.1016/j.mee.2009.01.068
Stato di pubblicazione	Pubblicato - 2009

Keywords

DXRL
Microneedles
PMMA
PVA
Soft lithography

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10.1016/j.mee.2009.01.068

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title = "Poly vinyl alcohol re-usable masters for microneedle replication",

abstract = "We present the first results of microstructure replica with re-usable masters in poly vinyl alcohol (PVA). Microneedles of heights ranging from 500 to 1100 pm were fabricated through double-exposure deep Xray lithography (DXRL) process and successfully replicated. A single PVA master was used as a template to successfully replicate up to 10 PMMA microneedle arrays, suggesting that this method might be a possible alternative to PDMS processes. A preliminary characterization of the relationship between the surface roughness of the substrates and the force required for demoulding was also performed. (C) 2009 Elsevier B.V. All rights reserved.",

keywords = "DXRL, Microneedles, PMMA, PVA, Soft lithography, DXRL, Microneedles, PMMA, PVA, Soft lithography",

author = "Marco Matteucci and Mattia Fanetti and M. Casella and Michele Casella and F. Gramatica and Luca Gavioli and M. Tormen and G. Grenci and \{De Angelis\}, F. and \{Di Fabrizio\}, E. and \{Di Fabrizio\}, \{Enzo Mario\}",

year = "2009",

doi = "10.1016/j.mee.2009.01.068",

language = "English",

volume = "86",

pages = "752--756",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Poly vinyl alcohol re-usable masters for microneedle replication

AU - Matteucci, Marco

AU - Fanetti, Mattia

AU - Casella, M.

AU - Casella, Michele

AU - Gramatica, F.

AU - Gavioli, Luca

AU - Tormen, M.

AU - Grenci, G.

AU - De Angelis, F.

AU - Di Fabrizio, E.

AU - Di Fabrizio, Enzo Mario

PY - 2009

Y1 - 2009

N2 - We present the first results of microstructure replica with re-usable masters in poly vinyl alcohol (PVA). Microneedles of heights ranging from 500 to 1100 pm were fabricated through double-exposure deep Xray lithography (DXRL) process and successfully replicated. A single PVA master was used as a template to successfully replicate up to 10 PMMA microneedle arrays, suggesting that this method might be a possible alternative to PDMS processes. A preliminary characterization of the relationship between the surface roughness of the substrates and the force required for demoulding was also performed. (C) 2009 Elsevier B.V. All rights reserved.

AB - We present the first results of microstructure replica with re-usable masters in poly vinyl alcohol (PVA). Microneedles of heights ranging from 500 to 1100 pm were fabricated through double-exposure deep Xray lithography (DXRL) process and successfully replicated. A single PVA master was used as a template to successfully replicate up to 10 PMMA microneedle arrays, suggesting that this method might be a possible alternative to PDMS processes. A preliminary characterization of the relationship between the surface roughness of the substrates and the force required for demoulding was also performed. (C) 2009 Elsevier B.V. All rights reserved.

KW - DXRL

KW - Microneedles

KW - PMMA

KW - PVA

KW - Soft lithography

KW - DXRL

KW - Microneedles

KW - PMMA

KW - PVA

KW - Soft lithography

UR - http://hdl.handle.net/10807/4986

U2 - 10.1016/j.mee.2009.01.068

DO - 10.1016/j.mee.2009.01.068

M3 - Article

SN - 0167-9317

VL - 86

SP - 752

EP - 756

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Poly vinyl alcohol re-usable masters for microneedle replication

Abstract

Keywords

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