Origins of Electronic Band Gap Reduction in Cr/N Codoped TiO2

C. Parks Cheney, P. Vilmercati, E. W. Martin, Mirco Chiodi, Luca Gavioli, M. Regmi, G. Eres, T. A. Callcott, H. H. Weitering, N. Mannella

Risultato della ricerca: Contributo in rivistaArticolo in rivistapeer review

42 Citazioni (Scopus)

Abstract

Recent studies indicated that noncompensated cation-anion codoping of wide-band-gap oxide semiconductors such as anatase TiO2 significantly reduces the optical band gap and thus strongly enhances the absorption of visible light [W. Zhu et al., Phys. Rev. Lett. 103, 226401 (2009)]. We used soft x-ray spectroscopy to fully determine the location and nature of the impurity levels responsible for the extraordinarily large (similar to 1 eV) band gap reduction of noncompensated codoped rutile TiO2. It is shown that Cr/N codoping strongly enhances the substitutional N content, compared to single element doping. The band gap reduction is due to the formation of Cr 3d(3) levels in the lower half of the gap while the conduction band minimum is comprised of localized Cr 3d and delocalized N 2p states. Band gap reduction and carrier delocalization are critical elements for efficient light-to-current conversion in oxide semiconductors. These findings thus raise the prospect of using codoped oxide semiconductors with specifically engineered electronic properties in a variety of photovoltaic and photocatalytic applications.
Lingua originaleEnglish
pagine (da-a)36404-36408
Numero di pagine5
RivistaPhysical Review Letters
Volume112
DOI
Stato di pubblicazionePubblicato - 2014

Keywords

  • CHARGE-TRANSFER
  • OXIDATION
  • OXIDE
  • RESONANT PHOTOEMISSION
  • RUTILE
  • SPECTROSCOPY
  • SURFACE
  • THIN-FILMS
  • VISIBLE-LIGHT
  • X-RAY-ABSORPTION

Fingerprint

Entra nei temi di ricerca di 'Origins of Electronic Band Gap Reduction in Cr/N Codoped TiO2'. Insieme formano una fingerprint unica.

Cita questo