Abstract
The combination of block copolymer micelle nanolithography (BCMN) with standard electron-beam lithography (EBL) and photolithography for rapid patterning of gold nanoparticles on two different length scales was presented. Cut silicon (110) chips and standard glass overslips were used as solid supports, while the formed miceller monolayer was treated with reactive hydrogen plasma upon evaporation of the solvent. The substrates are processed to yield coverslip-sized areas of micro-nanostructres with a patch size of 3 μm realizing the rapid parallel fabrication of high-quality micro-nanostructured surfaces with relatively low material and equipment cost. Only the nanostructured parts of the surface are covered by histidine-tagged GFP, proving the full preservation of protein repellent properties of the coupled PEG after the particle modification process.
Lingua originale | English |
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pagine (da-a) | 1014-1018 |
Numero di pagine | 5 |
Rivista | Small |
Volume | 5 |
DOI | |
Stato di pubblicazione | Pubblicato - 2009 |
Keywords
- Biomaterials
- Biotechnology
- Crystallization
- Engineering (miscellaneous)
- Equipment Design
- Equipment Failure Analysis
- Gold
- Materials Testing
- Miniaturization
- Molecular Conformation
- Nanostructures
- Nanotechnology
- Particle Size
- Protein Array Analysis
- Protein Binding
- Proteins
- Surface Properties
- gold
- lithography
- nanoparticles
- scanning force microscopy