Dynamics-induced surface metallization of Si(100)

Luca Gavioli; Maria Grazia Betti; Carlo Mariani

doi:10.1103/PhysRevLett.77.3869

Dynamics-induced surface metallization of Si(100)

Luca Gavioli, Maria Grazia Betti, Carlo Mariani

Risultato della ricerca: Contributo in rivista › Articolo in rivista › peer review

41 Citazioni (Scopus)

Abstract

High-temperature surface metallization of Si(100) is observed at T > 900 K by high-resolution electron-energy-loss and ultraviolet photoemission spectroscopy. Metallization takes place well below the incomplete surface melting temperature and is consistent with the Si dimer dynamics, characterized by an instantaneous symmetriclike dimer configuration. The surface free carrier concentration in the metallic phase has been evaluated, reaching (at 1170 K) the same order of magnitude of the surface dimer density.

Lingua originale	English
pagine (da-a)	3869-3872
Numero di pagine	4
Rivista	Physical Review Letters
Volume	77
DOI	https://doi.org/10.1103/PhysRevLett.77.3869
Stato di pubblicazione	Pubblicato - 1996

Keywords

ASYMMETRIC DIMERS
ELECTRONIC-STRUCTURE
ENERGY-LOSS SPECTROSCOPY
HIGH-TEMPERATURE
PHASE-TRANSITION
PHOTOELECTRON DIFFRACTION
PHOTOEMISSION
RECONSTRUCTED SURFACES
SI(001) SURFACE

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@article{7f2cc5203a42450398b46a53b74965a2,

title = "Dynamics-induced surface metallization of Si(100)",

abstract = "High-temperature surface metallization of Si(100) is observed at T > 900 K by high-resolution electron-energy-loss and ultraviolet photoemission spectroscopy. Metallization takes place well below the incomplete surface melting temperature and is consistent with the Si dimer dynamics, characterized by an instantaneous symmetriclike dimer configuration. The surface free carrier concentration in the metallic phase has been evaluated, reaching (at 1170 K) the same order of magnitude of the surface dimer density.",

keywords = "ASYMMETRIC DIMERS, ELECTRONIC-STRUCTURE, ENERGY-LOSS SPECTROSCOPY, HIGH-TEMPERATURE, PHASE-TRANSITION, PHOTOELECTRON DIFFRACTION, PHOTOEMISSION, RECONSTRUCTED SURFACES, SI(001) SURFACE, ASYMMETRIC DIMERS, ELECTRONIC-STRUCTURE, ENERGY-LOSS SPECTROSCOPY, HIGH-TEMPERATURE, PHASE-TRANSITION, PHOTOELECTRON DIFFRACTION, PHOTOEMISSION, RECONSTRUCTED SURFACES, SI(001) SURFACE",

author = "Luca Gavioli and Betti, {Maria Grazia} and Carlo Mariani",

year = "1996",

doi = "10.1103/PhysRevLett.77.3869",

language = "English",

volume = "77",

pages = "3869--3872",

journal = "Physical Review Letters",

issn = "0031-9007",

publisher = "American Physical Society",

}

TY - JOUR

T1 - Dynamics-induced surface metallization of Si(100)

AU - Gavioli, Luca

AU - Betti, Maria Grazia

AU - Mariani, Carlo

PY - 1996

Y1 - 1996

N2 - High-temperature surface metallization of Si(100) is observed at T > 900 K by high-resolution electron-energy-loss and ultraviolet photoemission spectroscopy. Metallization takes place well below the incomplete surface melting temperature and is consistent with the Si dimer dynamics, characterized by an instantaneous symmetriclike dimer configuration. The surface free carrier concentration in the metallic phase has been evaluated, reaching (at 1170 K) the same order of magnitude of the surface dimer density.

AB - High-temperature surface metallization of Si(100) is observed at T > 900 K by high-resolution electron-energy-loss and ultraviolet photoemission spectroscopy. Metallization takes place well below the incomplete surface melting temperature and is consistent with the Si dimer dynamics, characterized by an instantaneous symmetriclike dimer configuration. The surface free carrier concentration in the metallic phase has been evaluated, reaching (at 1170 K) the same order of magnitude of the surface dimer density.

KW - ASYMMETRIC DIMERS

KW - ELECTRONIC-STRUCTURE

KW - ENERGY-LOSS SPECTROSCOPY

KW - HIGH-TEMPERATURE

KW - PHASE-TRANSITION

KW - PHOTOELECTRON DIFFRACTION

KW - PHOTOEMISSION

KW - RECONSTRUCTED SURFACES

KW - SI(001) SURFACE

KW - ASYMMETRIC DIMERS

KW - ELECTRONIC-STRUCTURE

KW - ENERGY-LOSS SPECTROSCOPY

KW - HIGH-TEMPERATURE

KW - PHASE-TRANSITION

KW - PHOTOELECTRON DIFFRACTION

KW - PHOTOEMISSION

KW - RECONSTRUCTED SURFACES

KW - SI(001) SURFACE

UR - http://hdl.handle.net/10807/19995

U2 - 10.1103/PhysRevLett.77.3869

DO - 10.1103/PhysRevLett.77.3869

M3 - Article

SN - 0031-9007

VL - 77

SP - 3869

EP - 3872

JO - Physical Review Letters

JF - Physical Review Letters

ER -

Dynamics-induced surface metallization of Si(100)

Abstract

Keywords

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