Optimal reduction of a monitoring grid for SiO2 deposition surface over a wafer for semiconductor devices

Diego Zappa, Riccardo Borgoni, Luigi Radaelli, Valeria Tritto

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationSIS2010 Proceedings
Pages1-10
Number of pages10
Publication statusPublished - 2010
EventSIS 2010 - Padova
Duration: 16 Jun 201018 Jun 2010

Conference

ConferenceSIS 2010
CityPadova
Period16/6/1018/6/10

Keywords

  • Spatial processes
  • kriging methods
  • simulated annealing

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